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ONSO3305US - Onsemi346
6.The semiconductor package of claim 1, wherein one or more side walls of the semiconductor die are angled between 85 degrees and 60 degrees from a plane formed by the first side of the semiconductor die.
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ONSO3305US - Onsemi346
7.A semiconductor package comprising:
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ONSO3305US - Onsemi346
two or more bumps coupled to a second side of the die on either side of the active area;
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ONSO3305US - Onsemi346
a first redistribution layer (RDL) coupled to each of the two or more bumps and extending to an edge of the semiconductor die;
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ONSO3305US - Onsemi346
an optically transmissive lid coupled to the semiconductor die through the two or more bumps and the first RDL;
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ONSO3305US - Onsemi346
a second redistribution layer (RDL) coupled with the first RDL on the second side of the semiconductor die, the second RDL extending to the first side of the semiconductor die.
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ONSO3305US - Onsemi346
8.The semiconductor package of claim 7, wherein the two or bumps are coupled to two or more die pads.
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ONSO3305US - Onsemi346
9.The semiconductor package of claim 7, wherein a pad pitch of the two or more bumps is substantially 60 microns.
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ONSO3305US - Onsemi346
10.The semiconductor package of claim 7, wherein the two or more bumps are copper pillars comprising solder tips.
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ONSO3305US - Onsemi346
11.The semiconductor package of claim 10, wherein a pad pitch of the two or more bumps is substantially 70 microns.
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ONSO3305US - Onsemi346
12.The semiconductor package of claim 5, wherein the two or more bumps comprise solder balls.
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ONSO3305US - Onsemi346
13.The semiconductor package of claim 5, wherein one or more sidewalls of the semiconductor die are angled between 85 degrees and 60 degrees from a plane formed by the first side of the semiconductor die.
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ONSO3305US - Onsemi346
14.A method of forming a semiconductor package, the method comprising:
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ONSO3305US - Onsemi346
providing an optically transmissive substrate comprising a first side and a second side;
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ONSO3305US - Onsemi346
forming a first redistribution layer (RDL) on a first side of the optically transmissive substrate, the first RDL comprised over one or more scribe lines comprised on the first side of the optically transmissive substrate;
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ONSO3305US - Onsemi346
providing a semiconductor wafer comprising a first side and a second side, wherein a plurality of active areas is comprised on the second side of the semiconductor wafer and two or more die pads are comprised around each of the plurality of active areas;
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ONSO3305US - Onsemi346
forming two or more inner bumps on each of the two or more die pads
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ONSO3305US - Onsemi346
coupling the second side of the semiconductor wafer to the first side of the optically transmissive substrate, wherein the two or more inner bumps are coupled on either side of the one or more scribe lines;
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ONSO3305US - Onsemi346
thinning the semiconductor wafer to a predetermined thickness;
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ONSO3305US - Onsemi346
etching the semiconductor wafer to the one or more scribe lines to form a plurality of semiconductor die;
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