Term #940
etching
Claim Term
etching
Origin matter
—
Reference Case 1
FSP1813
Date Added
4/30/20
Created
4/30/20, 4:42 AM
Modified
4/30/20, 4:42 AM
Full Desc
"Etching" refers to one of many processes that may be used in microfabrication of an integrated semiconductor device or structure. Often, etching is used to selectively remove one material while leaving other materials mainly unchanged. In one embodiment, etching is used to chemically remove layers, such as a thin film, from a surface of a wafer during manufacturing. (Search "etching (microfabrication)" on Wikipedia.com Sept. 23, 2019. Edited, Accessed April 3, 2020.)Examples of etching include wet etching, dry etching, reactive ion etching, and plasma etching. Those of skill in the art will recognize these types of etching and how these types and future developed types may be used in connection with the disclosed solutions.