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thin film deposition
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2380.2.01
US-20150012794-A1
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Created Date
Full Desc
"Thin film deposition" refers to any technique for depositing a thin film of material onto a substrate or onto previously deposited layers. (Search "thin film" on Wikipedia.com April 1, 2020. Accessed April 3, 2020.) Examples of different types of thin film deposition include, but are not limited to, chemical deposition, physical deposition, epitaxy, and the like. Examples of chemical deposition include chemical solution deposition (CSD) or chemical bath deposition (CBD), spin coating or spin casting, dip coating, chemical vapor deposition (CVD), plasma enhanced CVD (PECVD), atomic layer deposition (ALD), molecular vapor deposition (MLD), and the like. Examples of physical deposition include a thermal evaporator, molecular beam epitaxy (MBE), an electron beam evaporator, sputtering, pulsed laser deposition, cathodic arc deposition, electrohydrodynamic deposition, and the like. Embodiments claimed and described herein may use one or more current or future thin film deposition techniques to implement one or more of the process steps disclosed.
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