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Application
2380.2.01
US-20150012794-A1
US-20150205664-A1
US-20100023800-A1
US-8737141-A1
US-10157004-B2
US10007433A1
US-9159419-B2
US-10114589-A1
US-10134728-A1
US-20200065270-A1
US-10637533-B2
US-9927986-A1
US-8380915-A1
US-9159419-A1
US-9208071-A1
US-20200098728-A1
US-10643676-A1
US-10468073-B2
US-10283200-A1
US-10461965-B1
US-20130279232-A1
US-8892980-B2
US9632727A1
US10558561A1
US20100023800A1
US7230213A1
OPT-9
FLO-2
FLO-5PROV
ONSO3175(B) - Onsemi378
ONSO3305US - Onsemi346
GTS-3DES
FLO-4
US8762658B2
US8533406B2
US9632727B2
KMN-1PROV
PAT-2
PER-8 PROV
PER-9 PROV
INS-4PROV
HAR-1
CES-16
NXT-5PROV NXT-5, 6, 7, 8
IPP-0051-US14 cross roads
FLO-7PROV
IMI-5PROV
IPP-0050-US35 nextremity
VIL-12
OPT-13
TOY-1
US10998041B1
FSP1845
US6559866B2
Placeholder App
PER-10
KBR-1 1400.2.623
PER-13PROV
PAT-3
US20030023453
RMS-1DES
SMG-1DES
FLO-5
US10318495
US10133662B2
PER-11
US20140066758
VIL-17
PER-17
JBR-1
PER-12
US11056880
US11302645
US20210407565
US11081191
PON-1PROV, 2PROV, 3PROV
PER-33
RMT-1PROV
PER-32
PER-34
MCC-1
FLO-10
PER-14
PER-19
PER-22
PER-18
PER-24
TMC-PAT-1
DAR-2
PER-23
TMC-PAT-4
PER-16
PER-4 DIV1
PER-20
PER-21
BRT-PAT-1
TMC-PAT-5
TMC-PAT-6PROV
BRT-PAT-2-PROV
71212.157.USU1
FPR-PAT-1-PROV
71212.158.USP1
RMT-1
DAR-1PROV
DAR-2PROV
PON-1PROV
PON-2PROV
PON-3PROV
PER-18PROV
TMC-1PROV
TMC-2PROV
PER-13PCT
PER-13
PER-16PROV
PER-14PROV
PER-34PROV
TMC-4PROV
TMC-3
PAS-1PROV
VEH-1
PER-29DES
TEST.001
E2E-TEST.001
TEST-001
TEST-002
TEST-003
TEST-004
ZED006
FSP1011
GAV-PAT-1-PROV
Matter Number
Paragraph Number
59
Application Number
16455676
Reference Case 1
Reference Case 2
Content
The method also includes etching of the semiconductor wafer to form a plurality of semiconductor die each coupled to the transmissive substrate. Each semiconductor die includes an active area on the second side of the die. The semiconductor wafer 36 is therefore etched on and around the scribe lines of the semiconductor wafer on the first side of the semiconductor wafer. In various implementations, etching may include wet etching and dry etching and may involve various patterning steps and operations including photolithography. Referring to FIG. 10, the plurality of semiconductor die 52 coupled to the optically transmissive substrate 24 following etching is illustrated. As illustrated, the sidewalls 54 of the semiconductor die 52 are angled. The sidewalls of the semiconductor die are angled during the etching process. In various implementations, the sidewalls may be angled between 85 degrees and 60 degrees from a plane formed by the first side of the semiconductor die.
Notes
Added by DJM 3 2021
Raw Data
<w:p w14:paraId="571B955E" w14:textId="6D688096" w:rsidR="006F2EFD" w:rsidRDefault="006F2EFD" w:rsidP="003326E6"><w:pPr><w:numPr><w:ilvl w:val="0"/><w:numId w:val="7"/></w:numPr><w:overflowPunct w:val="0"/><w:autoSpaceDE w:val="0"/><w:autoSpaceDN w:val="0"/><w:adjustRightInd w:val="0"/><w:spacing w:line="480" w:lineRule="auto"/><w:rPr><w:szCs w:val="24"/></w:rPr></w:pPr><w:r><w:rPr><w:szCs w:val="24"/></w:rPr><w:t>The method also includes etching of the semiconductor wafer to form a plurality of semiconductor die</w:t></w:r><w:r w:rsidR="0071784B"><w:rPr><w:szCs w:val="24"/></w:rPr><w:t xml:space="preserve"> each coupled to the </w:t></w:r><w:proofErr w:type="spellStart"/><w:r w:rsidR="0071784B"><w:rPr><w:szCs w:val="24"/></w:rPr><w:t>transmissive</w:t></w:r><w:proofErr w:type="spellEnd"/><w:r w:rsidR="0071784B"><w:rPr><w:szCs w:val="24"/></w:rPr><w:t xml:space="preserve"> substrate</w:t></w:r><w:r><w:rPr><w:szCs w:val="24"/></w:rPr><w:t xml:space="preserve">. </w:t></w:r><w:r w:rsidR="00B93FD9"><w:rPr><w:szCs w:val="24"/></w:rPr><w:t xml:space="preserve"> Each semiconductor die includes an active area on the second side of the die. </w:t></w:r><w:r><w:rPr><w:szCs w:val="24"/></w:rPr><w:t>The semiconductor wafer</w:t></w:r><w:r w:rsidR="0071784B"><w:rPr><w:szCs w:val="24"/></w:rPr><w:t xml:space="preserve"> 36</w:t></w:r><w:r><w:rPr><w:szCs w:val="24"/></w:rPr><w:t xml:space="preserve"> is</w:t></w:r><w:r w:rsidR="0071784B"><w:rPr><w:szCs w:val="24"/></w:rPr><w:t xml:space="preserve"> therefore</w:t></w:r><w:r><w:rPr><w:szCs w:val="24"/></w:rPr><w:t xml:space="preserve"> etched on and around the scribe lines of the semiconductor wafer</w:t></w:r><w:r w:rsidR="00B93FD9"><w:rPr><w:szCs w:val="24"/></w:rPr><w:t xml:space="preserve"> on the first side of the semiconductor wafer. In various implementations, etching may include wet etching and dry etching</w:t></w:r><w:r w:rsidR="0071784B"><w:rPr><w:szCs w:val="24"/></w:rPr><w:t xml:space="preserve"> and may involve various patterning steps and operations including photolithography</w:t></w:r><w:r w:rsidR="00B93FD9"><w:rPr><w:szCs w:val="24"/></w:rPr><w:t xml:space="preserve">. Referring to FIG. 10, the plurality of semiconductor die 52 coupled to the optically </w:t></w:r><w:proofErr w:type="spellStart"/><w:r w:rsidR="00B93FD9"><w:rPr><w:szCs w:val="24"/></w:rPr><w:t>transmissive</w:t></w:r><w:proofErr w:type="spellEnd"/><w:r w:rsidR="00B93FD9"><w:rPr><w:szCs w:val="24"/></w:rPr><w:t xml:space="preserve"> substrate 24 </w:t></w:r><w:r w:rsidR="00273652"><w:rPr><w:szCs w:val="24"/></w:rPr><w:t xml:space="preserve">following etching </w:t></w:r><w:r w:rsidR="00B93FD9"><w:rPr><w:szCs w:val="24"/></w:rPr><w:t>is illustrated. As illustrated, the sidewalls 54 of the semiconductor die 52 are angled. The sidewalls of the semiconductor die are angled during the etching process. In various implementations, the sidewalls may be angled between 85 degrees and 60 degrees</w:t></w:r><w:r w:rsidR="0071784B"><w:rPr><w:szCs w:val="24"/></w:rPr><w:t xml:space="preserve"> from a plane formed by the first side of the semiconductor die</w:t></w:r><w:r w:rsidR="00B93FD9"><w:rPr><w:szCs w:val="24"/></w:rPr><w:t xml:space="preserve">. </w:t></w:r></w:p>
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